Compared to the conventional amorphous silicon thin film, polycrystalline silicon film has a higher electron mobility and better optical stability

With the development of flat panel display technology and human importance of solar energy utilization , polycrystalline thin films attracted more and more attention. Compared with the conventional amorphous silicon thin film , polycrystalline silicon film has a higher electron mobility and better optical stability of the thin film transistor in flat panel displays as a channel layer and the silicon  synthetic diamond  cells have shown the use of absorbent layer more superior and stable performance. At present , the industrial preparation of polycrystalline silicon thin film deposition techniques which , mainly in chemical vapor deposition (CVD) based hot  Diamond blade  vapor deposition (HWCVD) , and plasma-enhanced chemical vapor deposition (PECVD) technique based. Chemical vapor  abrasive wheels  using a silane which is usually used as a reaction gas ; as an explosive dangerous toxic gas , the use of the silane in the industry need to be supplemented harsh security system and recycling system, resulting in high cost of polysilicon production high. Magnetron sputtering is a simple structure , low cost, a vacuum deposition technique . Since no silane , either production or cost control, safety , than the chemical vapor deposition by magnetron sputtering has a greater advantage .